Disilane (H6Si2) is a high-performance inorganic gas compound widely used in the preparation of semiconductors and solar materials. As a key raw material in Chemical Vapor Deposition (CVD) technology, Disilane stands out with its unique chemical properties such as low film-forming temperature, rapid film-forming rate, and excellent film quality, making it a preferred material in the industry.
Our Disilane product is produced using advanced preparation processes, ensuring high purity and stability. Through precisely controlled thermal decomposition or silane feed gas methods, we can manufacture Disilane gas that meets stringent industry standards. This product excels in PECVD, LPCVD, and other manufacturing processes, effectively enhancing the performance and reliability of the products.
Please note that Disilane is flammable and can self-ignite in contact with air, possibly forming explosive mixtures with air. Therefore, during use and storage, it is essential to strictly comply with relevant safety regulations and take appropriate personal protective measures to ensure the safety and health of the operators.
Our Disilane product not only conforms to the CAS Registry Number 1590-87-0 and the EINECS Registry Number 216-466-5 but also undergoes rigorous quality control to ensure the quality and consistency of each batch. We are committed to providing customers with high-quality, safe, and reliable Disilane products to meet the growing market demands.
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